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The Research group
The research projects in
Professor Holloway's group may be divided into the following categories:
Wide Bandgap Compound Semiconductors
for Band Edge Devices
Wide Bandgap Compound Semiconductors
for State-to-State Devices
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Wide Bandgap Compound Semiconductors for Band
Edge Devices
Ohmic
Contacts to p-type GaN
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Research is currently
being conducted into ohmic contacts to gallium nitride. The problem of
most interest is contacts to p-type materials, since this requires a metal
with too large a work function (7.5 eV). Because no metal has a work function
this large, several metal systems which exhibit interfacial reactions
have been investigated.
Our group is a world
leader in the understanding of interfacial reactions between metals and
semiconductors, and how such reaction may lead to low resistance contacts.
In the case of p-GaN, interfacial reactions with pure metals have only
led to high resistance contacts. Currently we are working with transparent,
thin oxide/metal contacts to both reduce the total contact resistance
as well as allow emission of light from LEDs or diode lasers.
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The above image shows Gallium
nitride light emitting diodes giving either blue or white light. The blue
comes directly from an indium gallium nitride quantum well. The white comes
from a quantum well emitting in the ultraviolet/blue region, with conversion
of UV to white light by a phosphor, similar to the phosphors in a fluorescent
light. Semiconductor LEDs will revolutionize lighting in our appliances, car
and home over the next few years.
back to research projects
Ohmic
Contacts to SiC
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Silicon carbide devices have a
large potential to be used as logic elements and amplifiers at temperatures
up to 600oC. However, the ohmic contacts to the devices must
be stable for long times at these elevated temperatures. We are determining
the role of interfacial reactions between contact metals and SiC substrates
to yield low resistance ohmic contacts. In addition, further interfacial
reactions during use at high temperatures must either reduce the specific
contact resistance, or at least not cause it to increase. Appropriate
layered metal thin film structures, deposition conditions and geometrical
configurations to achieve these objectives are being studied.
The image to the left depict one
application of silicon carbide high temperature microelctronics for control
of electric power.
High voltage, fast thyristors are being developed for these applications.
back
to research projects
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Zinc
Oxide Contacts to CuInSe2 Thin Film Solar Cells
ZnO contacts are used on the
top surface of CuInSe2 solar cells to allow light to be adsorbed
at the junction to generate power, but at the same time conduct the current
to the attached devices. A compromise is necessary since low resistivity
ZnO requires higher carrier concentrations, but these carriers adsorb
more light and reduce the solar cell efficiency. Both intrinsic and doped
ZnO thin films are being sputter deposited onto substrates with thicknesses
between 1 and 100 nm. The film morphology and composition are correlated
with both deposition conditions and electrical properties to understand
how to achieve better conductivity in the thin films. The objective is
to improve the microstructure of the ZnO thin films such that the resistivity
is lower, even for a lower carrier concentration, resulting in more efficient
solar cells.
Atomic force microscope images
of a smooth (left; RMS roughness = 0.3 nm) and rough (right; RMS roughness
= 0.9 nm) thin film of zinc oxide are shown.
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The
vertical roughness scale is 10 nm/division. The left film is very thin and just
coalescenced to a continuous ZnO. The film on the right is much thicker and
illustrates the development of microstructure with continued growth. |
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back
to research projects
Wide
Bandgap Compound Semiconductors for State-to-State Devices (Phosphors)
Electroluminescent Phosphors
In several research
projects, we are depositing thin films of zinc sulfide doped with either
transition or rare earth elements. This thin film phosphor is sandwiched
between dielectric layers and electrodes deposited on both sides. When
a field of about 1 MV/cm is applied across the phosphor, visible or
infrared light may be emitted. The wavelength of the light varies with
the dopant element. The intensity and efficiency of emission may be
varied by annealing and co-doping with other elements. Several research
projects are active in this area. In particular, we are studying doping
with terbium to achieve brighter, more efficient emission of green light
for full color electroluminescent flat panel displays. We are also studying
the doping of ZnS with other rare earth elements for enhanced emission
of infrared wavelengths in the range from 0.8 to 2 micrometers. Infrared
emission can be used for thermometry and communication purposes. Finally
we are studying the electroluminescence of nanopowder phosphors to determine
if quantum confinement of the excited electron state may be used to
enhance the radiative efficiency of the phosphor.
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To the left is an active matrix
electroluminescent full color display intended to be used in head mounted
displays because of its
small size. The phosphors being developed will allow brighter, more power
efficient displays.
back
to research projects
more
project descriptions
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