Ultrahigh-Vacuum (UHV) Lab

Variable Temperature AFM (VT-AFM)
The system is mounted with an Omicron variable temperature UHV AFM/STM and a four-grid retarding field analyzer used for low energy electron diffraction (LEED) and Auger electron spectroscopy (AES).  AFM/STM chamber could perform an experiment in situ from 100 K (cooling with liquid Nitrogen) to 750K, while the manipulator could hold temperature from 100 K to 1100 K.  Base pressure of the system is 2 x10^-10 torr (room temperature).

RHK AFM 100/RHK STM 1000 control electronics and software (RHK Technology, Inc., Troy, MI, USA) were equipped as control electronics and used for data collection and data process.  The operation of laser diode and the photo detector is controlled by the RHK AFM 100 electronics and the movement of the piezoelectric scan tube is controlled by RHK STM 1000 electronics.

Time-of-Flight Mass Spectrometer (TOF-MS)
The TOF-MS system is used to investigate high molecular weight adsorbates that closely resemble commercially available lubricant species. Aside from its ability to record unlimited mass range, this technique can conveniently obtain mass spectrum at a relatively high speed. This system, under ultrahigh vacuum environment is equipped with an electron impact ionization source, microchannel plate detector, and pulsed operation of both electron beam and repeller.

X-ray Photoelectron Spectrometer (XPS)
This ultrahigh vacuum chamber is used to characterize carbide surfaces and their chemical reactivity with specific adsorbates. It has the capability of performing X-ray Photoelectron Spectroscopy (XPS), Ultraviolet Photoelectron Spectroscopy (UPS) and Temperature Programmed Desorption (TPD) at both cryogenic and high temperatures. It is equipped with turbo, ion, and TSP pumps (giving a base pressure of 2 x 10^-10 torr), as well as a quadrupole mass spectrometer (QMS) and an electrostatic hemispherical analyzer.

Location

	Materials Engineering Bldg. Roooms 115 & 124 (352) 846-3340 See directions below