Contact Info Biographical Info Research Interests	Publications Team Singh Current Courses

Research Interests:

The Singh group explores a wide variety of different materials research areas, including: Innovative processing of materials; Laser processing; thin films; transient thermal phenomena; superconducting and dielectric(low K and high K) thin films; diamond and related materials, rapid thermal processing of elemental and wide band gap semiconductors, chemical-mechanical planarization, particulate coatings;semiconductor processing; modeling of transient thermal processing; flat panel displays, Angstrom scale advanced materials characterization, oxide thin films & electronics, gallium nitride and diamond crystal growth, nanoparticle synthesis and processing, front and back end semiconductor cleaning, phosphors and flat panel displays, thin film batteries.

This system is an Electron-Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD) chamber which we have used in research related to diamond and other carbon-based thin films, low-K dielectrics, and other thin films. This system uses a 2.45 GHz microwave source and a ring of rare earth magnets to create a plasma which is used to break down gaseous precursors and deposit films onto a variety of substrates.

This is a look inside our ultraviolet-enhanced pulsed laser deposition (UV-PLD) chamber. This system is capable of ultra high vacuum (UHV) conditions and is used for pulsed laser deposition (PLD) of thin oxide films. The system has also been fitted with an ultraviolet light source for in-situ photo assisted PLD, and has the capability for multiple ablation targets which facilitates fabrication of multilayered films.

This is our ultra high vacuum (UHV) sputtering system. Sputtering is one of the most commonly used industrial techniques for depositing thin films. The physical vapor deposition process of sputtering involves the controlled transfer of atoms, removed from a source and deposited onto a substrate through impact of gaseous ions where film formation and growth proceed atomistically. The system shown above is a versatile UHV system which has both DC and RF sputtering capabilities. Two of the ion guns are configured for the deposition of magnetic materials. The system is computerized and the deposition process can be controlled entirely through the computer.

This SQUID (Superconducting Quantum Interference Device) system is capable of characterization tasks that require the highest detection sensitivities over a broad temperature range and in applied fields of up to 5 Tesla. It's capable of resolving changes in external magnetic fields that approach 10-15 Tesla, yet can be made to operate in fields as large as 5 Tesla.

This is our CV/IV system. It is used to measure the electrical quality, dielectric constants, and leakage currents of the thin films we make in the lab. It also has a heated stage which gives the capability of measuring film properties as a function of temperature.

S.L.I.M. Laser Simulation Software:

Dr. Singh has written a program called S.L.I.M. (Simulation of Laser Interactions with Matter). This program can be used to simulate the thermal effects of laser beam interactions with any target of known composition, based on input parameters provided by the user. Below is a link to a Winzip archive which contains the demo version of the program. To download the S.L.I.M. demo, click the link below and choose "save file" from the menu that appears. Once you have downloaded the file "SLIMdemo.zip" you can use Winzip to extract the three files provided. Please open and read the file named "readme.txt" first for instructions.

SLIMdemo.zip